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Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94
Figure 1: (a) Picture of the resistance reference sample connected to the probe station. (b) Top view of the ...
Figure 2: Resistance map of the sample’s central zone (60 µm × 60 µm) imaged by C-AFM. Numbers refer to the i...
Figure 3: Relative deviations Δ = (Ri,AFM – Ri,cal)/Ri,cal in percent from imaging (full grey circles) and fr...
Beilstein J. Nanotechnol. 2019, 10, 1523–1536, doi:10.3762/bjnano.10.150
Figure 1: Basic principle for measuring the NP height by AFM and NP lateral diameters by SEM.
Figure 2: Principle of SEM and AFM calibration using the reference structure measured by mAFM.
Figure 3: Micro-lithographed chips specifically developed for hybrid metrology and used as a repositioning sy...
Figure 4: Silica FD304 NPs deposited on the repositioning chip for a direct comparison of a) AFM and b) SEM m...
Figure 5: Comparison of NP height measurements performed by AFM and: (a) DSEM, (b) DFmin, (c) DFmax of severa...
Figure 6: Comparison of AFM height measurement, HAFM and (a) DFmin, (b) DFmax on the same sets of PSL and SiO2...
Figure 7: Profiles obtained by (a) SEM and (b) AFM, on a single NP of FD304 or PSL with the same diameter mea...
Figure 8: Profiles obtained by (a) AFM and (b) SEM, on a single NP of FD304 or PSL with the same height measu...
Figure 9: (a) Comparison of (DFmin/DFmax), (HAFM/DFmin) and (HAFM/DSEM) for each NP population (ERM-FD102, ER...